<?xml version="1.0" encoding="UTF-8"?>
<resource xsi:schemaLocation="http://datacite.org/schema/kernel-4 http://schema.datacite.org/meta/kernel-4/metadata.xsd"
          xmlns="http://datacite.org/schema/kernel-4"
          xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance">
    <identifier identifierType="DOI">10.26165/JUELICH-DATA/0X7H3S</identifier>
    <creators><creator><creatorName>Schäpers, Thomas</creatorName><nameIdentifier schemeURI="https://orcid.org/" nameIdentifierScheme="ORCID">0000-0001-7861-5003</nameIdentifier><affiliation>(Peter Grünberg Institute 9)</affiliation></creator></creators>
    <titles>
        <title>Fabrication and characterization of InAs nanowire-based quantum dot structures utilizing buried bottom gates</title>
    </titles>
    <publisher>Jülich DATA</publisher>
    <publicationYear>2025</publicationYear>
    <resourceType resourceTypeGeneral="Dataset"/>
    
    <descriptions>
        <description descriptionType="Abstract">Semiconductor nanowires can be utilized to create quantum dot qubits. The formation of quantum dots is typically achieved by means of bottom gates created by a lift-off process. As an alternative, we fabricated flat buried bottom gate structures by filling etched trenches in a Si substrate with sputtered TiN, followed by mechanical polishing. This method achieved gate line pitches as small as 60 nm. The gate fingers have low gate leakage. As a proof of principle, we fabricated quantum dot devices using InAs nanowires placed on the gate fingers. These devices exhibit single electron tunneling and Coulomb blockade.</description>
    </descriptions>
    <contributors><contributor contributorType="ContactPerson"><contributorName>Schäpers, Thomas</contributorName><affiliation>(Peter Grünberg Institute 9)</affiliation></contributor></contributors>
</resource>
