<?xml version='1.0' encoding='UTF-8'?><metadata xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dcterms="http://purl.org/dc/terms/" xmlns="http://dublincore.org/documents/dcmi-terms/"><dcterms:title>JART ECM v1 var</dcterms:title><dcterms:identifier>https://doi.org/10.26165/JUELICH-DATA/WHSSZA</dcterms:identifier><dcterms:creator>Ahmad, Rana Walied</dcterms:creator><dcterms:creator>Menzel, Stephan</dcterms:creator><dcterms:publisher>Jülich DATA</dcterms:publisher><dcterms:issued>2025-08-15</dcterms:issued><dcterms:modified>2025-08-15T11:27:36Z</dcterms:modified><dcterms:description>A purely physics-based variability-aware compact model of electrochemical metallization memory (ECM) cells is presented. Since this extension consists of several different features allowing for a realistic variability-aware fit, it depicts a unique model comprising physics-based, stochastically and experimentally originating variabilities and reproduces them well. It is based on the deterministic ECM model JART ECM v1.&#xd;
The variability-aware model introduces device-to-device variability by choosing the model parameters from a physically reasonable value range. The cycle-to-cycle variability can be introduced by updating these parameters according to a random walk algorithm after a certain time step. Moreover, a stochastic feature is added to the gap evolution within the model’s main dynamics-determining differential equation. The model is validated by experimental data of Cu/SiO2/W&#xd;
ECM cells. This model can be used in higher-level circuit simulators like Spectre to design variability-aware application circuits.&#xd;
[1] shows (a) experimentally measured and (b) simulatively verified device-to-device variability for SET kinetics analysis. [2] shows experimentally measured I–V sweeps in red, simulated I–V sweeps in blue: (a) experimentally recorded I–V sweep, (b) simulated I-V sweep characteristics with all simulation modifications, (c) - (f) simulated I–V sweep characteristics showing individual types of simulation modifications.</dcterms:description><dcterms:subject>Computer and Information Science</dcterms:subject><dcterms:subject>Engineering</dcterms:subject><dcterms:subject>Physics</dcterms:subject><dcterms:subject>Other</dcterms:subject><dcterms:subject>memristive devices, variability-aware modeling, ReRAM, ECM, CBRAM, SPICE level, compact model</dcterms:subject><dcterms:isReferencedBy>R. W. Ahmad et al. “Variability-Aware Modeling of Electrochemical Metallization Memory Cells”. In: Neuromorphic Computing and Engineering 4.3 (2024), doi, 10.1088/2634-4386/ad57e7, https://iopscience.iop.org/article/10.1088/2634-4386/ad57e7</dcterms:isReferencedBy><dcterms:contributor>Ahmad, Rana Walied</dcterms:contributor><dcterms:dateSubmitted>2025-07-27</dcterms:dateSubmitted><dcterms:license>CC0</dcterms:license><dcterms:rights>CC0 Waiver</dcterms:rights></metadata>