<?xml version='1.0' encoding='UTF-8'?><codeBook xmlns="ddi:codebook:2_5" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="ddi:codebook:2_5 https://ddialliance.org/Specification/DDI-Codebook/2.5/XMLSchema/codebook.xsd" version="2.5"><docDscr><citation><titlStmt><titl>JART ECM v1</titl><IDNo agency="DOI">doi:10.26165/JUELICH-DATA/4F3ITW</IDNo></titlStmt><distStmt><distrbtr source="archive">Jülich DATA</distrbtr><distDate>2025-03-25</distDate></distStmt><verStmt source="DVN"><version date="2025-03-25" type="RELEASED">1</version></verStmt><biblCit>Menzel, Stephan; Bengel, Christopher, 2025, "JART ECM v1", https://doi.org/10.26165/JUELICH-DATA/4F3ITW, Jülich DATA, V1</biblCit></citation></docDscr><stdyDscr><citation><titlStmt><titl>JART ECM v1</titl><IDNo agency="DOI">doi:10.26165/JUELICH-DATA/4F3ITW</IDNo></titlStmt><rspStmt><AuthEnty affiliation="Peter Grünberg Institut (PGI-7)">Menzel, Stephan</AuthEnty><AuthEnty affiliation="RWTH Aachen University">Bengel, Christopher</AuthEnty></rspStmt><prodStmt/><distStmt><distrbtr source="archive">Jülich DATA</distrbtr><contact affiliation="Peter Grünberg Institut (PGI-7)" email="st.menzel@fz-juelich.de">Menzel, Stephan</contact><depositr>Schön, Daniel</depositr><depDate>2025-03-25</depDate></distStmt></citation><stdyInfo><subject><keyword>Chemistry</keyword><keyword>Computer and Information Science</keyword><keyword>Engineering</keyword><keyword>Physics</keyword></subject><abstract>The JART ECM v1 model describes the switching dynamics of Electrochemical Metallization Cells, which are also known as Conductive Bridge RAM (CBRAM) or atomic switches. The model includes the redox-reactions at the metal insulator interfaces, ion hopping transport, and the electrocrystallization of the filament nucleus (see Figure 1). The conduction mechanism is modeled here as an electron tunneling process. The model was originally developed to model the switching dynamics of a Ag/AgI/Pt device [1]. Later it was applied to GeSx based ECM cells [2] and a Ag/SiOx based system [3].</abstract><sumDscr/></stdyInfo><method><dataColl><sources/></dataColl><anlyInfo/></method><dataAccs><notes type="DVN:TOU" level="dv">CC0 Waiver</notes><setAvail/><useStmt/></dataAccs><othrStdyMat><relPubl><citation><titlStmt><IDNo agency="doi">https://doi.org/10.1039/C3CP50738F</IDNo></titlStmt><biblCit>[1] S. Menzel, S. Tappertzhofen, R. Waser and I. Valov, Switching Kinetics of Electrochemical Metallization Memory Cells, PCCP 15, 6945-6952 (2013).</biblCit></citation><ExtLink URI="https://doi.org/10.1039/C3CP50738F"/></relPubl><relPubl><citation><titlStmt><IDNo agency="doi">https://doi.org/10.1021/acs.jpcc.5b03622</IDNo></titlStmt><biblCit>[2] J. van den Hurk, S. Menzel, R. Waser and I. Valov, Processes and Limitations during Filament Formation and Dissolution in GeSx-based ReRAM memory cells, J. Phys. Chem. C 119, 18678-18685 (2015).</biblCit></citation><ExtLink URI="https://doi.org/10.1021/acs.jpcc.5b03622"/></relPubl><relPubl><citation><titlStmt><IDNo agency="doi">https://doi.org/10.1088/1361-6528/aa5e59</IDNo></titlStmt><biblCit>[3] M. Luebben, S. Menzel, S. G. Park, M. Yang, R.Waser and I. Valov, SET kinetics of electrochemical metallization cells - Influence of counter electrodes in SiO2/Ag based systems, Nanotechnology 28, 135205/1-6 (2017).</biblCit></citation><ExtLink URI="https://doi.org/10.1088/1361-6528/aa5e59"/></relPubl></othrStdyMat></stdyDscr><otherMat ID="f28444" URI="https://data.fz-juelich.de/api/access/datafile/28444" level="datafile"><labl>Figure1.jpg</labl><txt>Ionic and Electronic process included in the JART ECM v1 model.</txt><notes level="file" type="DATAVERSE:CONTENTTYPE" subject="Content/MIME Type">image/jpeg</notes></otherMat><otherMat ID="f28445" URI="https://data.fz-juelich.de/api/access/datafile/28445" level="datafile"><labl>JART ECM v1-veriloga.va</labl><txt>The Verilog-A code of this model</txt><notes level="file" type="DATAVERSE:CONTENTTYPE" subject="Content/MIME Type">application/octet-stream</notes></otherMat></codeBook>