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Part 1: Document Description
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Citation |
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Title: |
Data used in: Reversible Switching of the Environment-Protected Quantum Spin Hall Insulator Bismuthene at the Graphene/SiC Interface |
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Identification Number: |
doi:10.26165/JUELICH-DATA/NRZVPE |
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Distributor: |
Jülich DATA |
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Date of Distribution: |
2025-07-08 |
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Version: |
1 |
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Bibliographic Citation: |
Niclas Tilgner; Susanne Wolff; Serguei Soubatch; Tien-Lin Lee; Andres David Peña Unigarro; Sibylle Gemming; F. Stefan Tautz; Thomas Seyller; Christian Kumpf; Fabian Göhler; Philip Schädlich, 2025, "Data used in: Reversible Switching of the Environment-Protected Quantum Spin Hall Insulator Bismuthene at the Graphene/SiC Interface", https://doi.org/10.26165/JUELICH-DATA/NRZVPE, Jülich DATA, V1 |
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Citation |
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Title: |
Data used in: Reversible Switching of the Environment-Protected Quantum Spin Hall Insulator Bismuthene at the Graphene/SiC Interface |
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Identification Number: |
doi:10.26165/JUELICH-DATA/NRZVPE |
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Authoring Entity: |
Niclas Tilgner (Institute of Physics, Chemnitz University of Technology) |
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Susanne Wolff (Institute of Physics, Chemnitz University of Technology) |
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Serguei Soubatch (Peter Grünberg Institut (PGI-3), Forschungszentrum Jülich) |
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Tien-Lin Lee (Diamond Light Source Ltd) |
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Andres David Peña Unigarro (Institute of Physics, Chemnitz University of Technology) |
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Sibylle Gemming (Institute of Physics, Chemnitz University of Technology) |
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F. Stefan Tautz (Peter Grünberg Institut (PGI-3), Forschungszentrum Jülich) |
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Thomas Seyller (Institute of Physics, Chemnitz University of Technology) |
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Christian Kumpf (Peter Grünberg Institut (PGI-3), Forschungszentrum Jülich) |
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Fabian Göhler (Institute of Physics, Chemnitz University of Technology) |
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Philip Schädlich (Institute of Physics, Chemnitz University of Technology) |
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Grant Number: |
Research Unit FOR5242 (project 449119662) |
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Grant Number: |
Collaborative Research Centre No. 223848855-SFB 1083, sub-project A12 |
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Distributor: |
Jülich DATA |
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Access Authority: |
Subach, Sergey |
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Access Authority: |
Christian Kumpf |
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Access Authority: |
Fabian Göhler |
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Access Authority: |
Philip Schädlich |
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Depositor: |
Subach, Sergey |
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Date of Deposit: |
2025-05-15 |
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Study Scope |
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Keywords: |
Physics |
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Abstract: |
We provide here the raw data used to produce Figures in <br> <i> Niclas Tilgner, Susanne Wolff, Serguei Soubatch, Tien-Lin Lee, Andres David Peña Unigarro, Sibylle Gemming, F. Stefan Tautz, Thomas Seyller, Christian Kumpf, Fabian Göhler, and Philip Schädlich, </i><br><b> "Reversible Switching of the Environment-Protected Quantum Spin Hall Insulator Bismuthene at the Graphene/SiC Interface" </b><br> Nature Communications <b>16</b>, 6171 (2025), DOI: 10.1038/s41467-025-60440-x <br><br> |
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Methodology and Processing |
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Sources Statement |
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Data Access |
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Other Study Description Materials |
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Related Publications |
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Citation |
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Bibliographic Citation: |
<i> Niclas Tilgner, Susanne Wolff, Serguei Soubatch, Tien-Lin Lee, Andres David Peña Unigarro, Sibylle Gemming, F. Stefan Tautz, Thomas Seyller, Christian Kumpf, Fabian Göhler, and Philip Schädlich, </i><br><b> "Reversible Switching of the Environment-Protected Quantum Spin Hall Insulator Bismuthene at the Graphene/SiC Interface" </b><br> Nature Communications <b>16</b>, 6171 (2025), DOI: 10.1038/s41467-025-60440-x |
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Label: |
Figure_1_ARPES_Precursor_GK-direction.txt |
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Text: |
ARPES intensity of the precursor phase measured along the Г-К direction and used to produce Figure 1. |
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Notes: |
text/plain |
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Figure_1_ARPES_Precursor_GM-direction.txt |
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Text: |
ARPES intensity of the precursor phase measured along the Г-М direction and used to produce Figure 1. |
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Notes: |
text/plain |
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Figure_1_NIXSW-imaging_Precursor.txt |
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Text: |
Coherent fractions and coherent positions of the bulk components (Si and C) and Bi of the precursor phase derived from NIXSW measurements with different Bragg reflections and used to construct the atomic-density-distribution maps in Figure 1 d, e, and f. |
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Notes: |
text/plain |
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Figure_2_ARPES_Bismuthene_GK-direction.txt |
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Text: |
ARPES intensity of bismuthene measured along the Г-К direction and used to produce Figure 2. |
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Notes: |
text/plain |
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Figure_2_ARPES_Bismuthene_GM-direction.txt |
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Text: |
ARPES intensity of bismuthene measured along the Г-М direction and used to produce Figure 2. |
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Notes: |
text/plain |
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Figure_2_NIXSW-imaging_Bismuthene.txt |
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Text: |
Coherent fractions and coherent positions of the bulk components (Si and C) and Bi of bismuthene derived from NIXSW measurements with different Bragg reflections and used to construct the atomic-density-distribution maps in Figure 2 a and b. |
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Notes: |
text/plain |
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Figure_3a_ARPES_4H.txt |
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Text: |
ARPES intensity of bismuthene on 4H-SiC used to produce Figure 3a. |
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Notes: |
text/plain |
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Figure_3b_ARPES_6H.txt |
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Text: |
ARPES intensity of bismuthene on 6H-SiC used to produce Figure 3b. |
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Notes: |
text/plain |
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Figure_3c_ARPES_4H+Cs.txt |
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Text: |
ARPES intensity of bismuthene on 4H-SiC with Cs used to produce Figure 3c. |
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Notes: |
text/plain |
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Figure_3d_ARPES_6H+Cs.txt |
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Text: |
ARPES intensity of bismuthene on 6H-SiC with Cs used to produce Figure 3d. |
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Notes: |
text/plain |
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LEED_Precursor_100eV.bmp |
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Text: |
Low-energy electron diffraction pattern of the precursor phase measured with 100 eV electrons. |
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Notes: |
image/bmp |